Alloy Sputtering Target acetron.net

Ti+Al, Al+Sc, Ag, Indium+Tin, Ni+Cr | Alloy Sputtering Target Supplier

Alloy sputtering targets play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industries such as electronics, optics, and coatings. Acetron, as a target supplier, also offers particular customize targets to the clients. We offer customized target products made of high-purity raw material powder with super fine grain size. These products have the recognized consistent microstructure to achieve a longer life for targets and desired characteristics of the sputtering deposited thin film.

Ti+Al (Titanium Aluminum) Alloy Sputtering Target:
Material Composition: Titanium (Ti) and Aluminum (Al) alloy

Description: Ti+Al alloy sputtering targets are used for the deposition of thin films with specific properties such as corrosion resistance, high temperature resistance, and mechanical strength. These alloys find applications in aerospace, automotive, and biomedical industries.

Al+Sc (Aluminum Scandium) Alloy Sputtering Target:
Material Composition: Aluminum (Al) and Scandium (Sc) alloy

Description: Al+Sc alloy sputtering targets are utilized for the deposition of thin films with enhanced mechanical properties, such as high strength, lightweight, and improved corrosion resistance. These alloys are commonly used in aerospace, sporting goods, and automotive components.

Ag (Silver) Alloy Sputtering Target:
Material Composition: Silver (Ag) alloy

Description: Ag sputtering targets are employed for the deposition of silver thin films in various applications, including optical coatings, electrical contacts, and decorative finishes. Silver films exhibit excellent electrical conductivity and optical reflectivity, making them suitable for electronic and optical devices.